Practical Pattern Detection from Distributed Defect Points on a Semiconductor Wafer
نویسندگان
چکیده
A spatial pattern recognition algorithm is proposed to determine root causes of defects on semiconductor wafers by visually identifying regional defect point set patterns. The algorithm classifies defects into either random patterns or regional patterns. Four different types of regional patterns are identified: rings, blobs, lines and arcs. Ring and blob patterns are detected by template matching techniques, while line and arc patterns are detected by utilizing their geometric properties. The proposed algorithm was evaluated using 193 sample wafers with regional defect patterns. 182 of the samples (94.3%) were processed correctly. Processing time for a wafer containing 10,000 defect points was 6 sec using the pentiumm IV 1.4 GHz microprocessor.
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تاریخ انتشار 2002